We present a noncontact and nondestructive method to measure thermal conductivity in layered materials using micro-Raman scattering. This method was successfully applied to monocrystalline silicon whose thermal conductivity was found to be 63 W/m K at about 550 °C and then applied to porous silicon layers. For a 50 μm thick layer with 50% porosity, we found a thermal conductivity of 1 W/m K confirming the thermal insulating properties of this material.
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Périchon et al. (1999) studied this question.
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