Reaction mechanisms between titanium isopropoxide and deuterated water in the atomic layer deposition (ALD) of TiO2 at 150–350 °C were studied using a quartz crystal microbalance (QCM) and a quadrupole mass spectrometer (QMS). The temperature had no marked effect on the total amount of the main gaseous by-product (CH3)2CHOD. At 150–250 °C, about half of the ligands were released in reactions with surface hydroxyl groups during the Ti(OCH(CH3)2)4 pulse, and the other half during the water pulse. At higher temperatures, Ti(OCH(CH3)2)4 began to thermally decompose, thus affecting the growth mechanism. The results were compared with earlier CVD and ALD studies.
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Rahtu et al. (2002) studied this question.