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A novel three degree-of-freedom micropositioner was developed for deep ultraviolet lithography applications. The design of the micropositioner utilizes the monolithic flexural mechanism with built-in multilayer piezoelectric actuators and sensors to achieve translations in the X- and Y-axes and rotation in the theta(Z)-axis. The compact design aims at high resolution, high stiffness, and extremely low crosstalk interference. Parametric analyses of harmonic and forced vibrations are conducted to solve the derived dynamic models for the near optimum geometry of the micropositioner. Furthermore, the error budget analysis is conducted to minimize the effects of the geometric tolerance, material variation, and hysteresis errors.
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Chang et al. (1999) studied this question.
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