Photopumped room-temperature continuous operation of native-oxide-embedded AlyGa1−yAs-GaAs-InxGa1−xAs quantum-well-heterostructure lasers

Data are presented on the 300 K (and 77 K) continuous photopumped laser operation of AlyGa1−yAs-GaAs-InxGa1−xAs quantum-well heterostructures (QWHs) that have been oxidized (H2O vapor+N2, 425 °C) selectively along the high-band-gap heterolayers located on either side of a GaAs waveguide (WG) region with an InxGa1−xAs QW in its center. Transmission electron microscope images show that the oxide-embedded GaAs-InxGa1−xAs WG+QW active region remains unoxidized and thus is sandwiched between electrically insulating AlyGa1−yAs native oxide layers. The thresholds for photopumped 300 K continuous laser operation of the as-grown and oxide-embedded QWHs are approximately equal after differences in the Ar+-laser photopumping efficiencies are considered.