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May 1, 1965IBM Journal of Research and Development

Analysis of the Impurity Atom Distribution Near the Diffusion Mask for a Planar p-n Junction

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Authors

DKDavid P. KennedyRAND CorporationROR. R. O’BrienIBM (United States)

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Kennedy et al. (1965) studied this question.

synapsesocial.com/papers/6a6f2d3f78a11c550e08dbb2https://doi.org/10.1147/rd.93.0179
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  5. 5Depletion Layer Properties in Double Diffused Transistors†1961 · 8 citations