The feasibility of the smart voltage extension (SVX) technique featuring complementary high-voltage devices without any modifications of the process steps of an 0.5-μm standard CMOS technology is discussed here. This letter focuses on the optimization of the breakdown voltage of the HVNMOS as well as the possible implementation of the HVPMOS. Different high-voltage options with increasing process modification steps are discussed as a function of the required high-voltage capabilities.
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Bassin et al. (2000) studied this question.
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