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August 1, 1967Journal of Applied Physics

Diffusion in Silicon. I. Effect of Dislocation Motion on the Diffusion Coefficients of Boron and Phosphorus in Silicon

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TPT.J. ParkerUniversity of Essex

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T.J. Parker (1967) studied this question.

synapsesocial.com/papers/6a6f2ef778a11c550e08dd8ehttps://doi.org/10.1063/1.1710152
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Also Consider

Synapse has enriched 4 closely related papers on similar clinical questions. Consider them for comparative context:

  1. 1The Diffusion of Phosphorus in Silicon1962 · 61 citations
  2. 2Distribution of Dislocations near the Junction Formed by Diffusion of Phosphorus in Silicon1964 · 42 citations
  3. 3Formation of Junction Structures by Solid-State Diffusion1958 · 62 citations
  4. 4The Cooperative Diffusion Effect1966 · 53 citations