Textured ZnO films with low resistivity and high transparency in a wide wavelength range from 400 nm to 1400 nm have been successfully grown by the photo-induced metalorganic chemical vapor deposition (MOCVD) technique. It was found that ultraviolet irradiation during deposition was very effective in improving the electrical properties of the films, even with a low intensity. The obtained films have a good uniformity along the 10×10 cm 2 substrate.
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Yoshino et al. (1993) studied this question.
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