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December 1, 1967Canadian Journal of Physics

Ion Implantation of Silicon: Ii. Electrical Evaluation Using Hall-Effect Measurements

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Authors

JMJ. W. MayerON Semiconductor (United States)OMO. J. MarshCalifornia Institute of TechnologyGSG. A. ShifrinHRL Laboratories (United States)

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Mayer et al. (1967) studied this question.

synapsesocial.com/papers/6a6f7699febe604dd708620chttps://doi.org/10.1139/p67-340
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  4. 4ANALYSIS OF Sb-IMPLANTED SILICON BY (<i>p, p</i>) SCATTERING AND HALL MEASUREMENTS1967 · 27 citations
  5. 5SOLUBILITY EFFECTS OF IMPLANTED IONS IN SEMICONDUCTORS1967 · 14 citations