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February 1, 1984Journal of The Electrochemical Society

A Mathematical Model of the Coupled Fluid Mechanics and Chemical Kinetics in a Chemical Vapor Deposition Reactor

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MCMichael E. ColtrinLockheed Martin (United States)RKRobert J. KeeColorado School of MinesJMJames A. MillerGeneral Motors (United States)

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Coltrin et al. (1984) studied this question.

synapsesocial.com/papers/6a6f7fbc75498292b708e21dhttps://doi.org/10.1149/1.2115598
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