The possibilities for quantitative compositional analysis of TiN x layers prepared by d.c. magnetron sputtering with Auger electron spectroscopy and x‐ray photoelectron spectroscopy are discussed. As an alternative to the AES quantification schemes reported in the literature, methods based on the ‘peak‐to‐peak‐minus‐ x ‐eV‐height’ and ‘factor analysis’ are examined. Different background subtraction methods are studied for the XPS quantification.
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Bender et al. (1989) studied this question.
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