What question did this study set out to answer?

Develop a photolithographic method to fabricate refractive index Bragg gratings within photosensitive monomode optical fibers using a specialized silica glass phase mask.

March 8, 1993Applied Physics Letters

Bragg gratings fabricated in monomode photosensitive optical fiber by UV exposure through a phase mask

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Authors

KHK. O. HillUniversity of Auckland BMB. MaloCommunications Research Centre Canada FBF. BilodeauUniversité de Montréal

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Overview

Experimental study demonstrates efficient photoimprinting of Bragg gratings in photosensitive optical fibers via silica phase masks, indicating simplified fabrication with reduced alignment...

Key Points

Develop a photolithographic method to fabricate refractive index Bragg gratings within photosensitive monomode optical fibers using a specialized silica glass phase mask.
Directed a 249 nm KrF excimer laser beam at normal incidence through a silica glass phase mask grating.
Placed photosensitive optical fiber parallel to and in close proximity behind the mask, with mask striations aligned normal to the fiber axis.
Diffracted UV light created a periodic, high-contrast intensity pattern at half the phase mask pitch, photoimprinting refractive index modulations into the fiber core.
The fabrication method decreased apparatus mechanical sensitivity and functioned successfully with laser sources possessing low spatial and temporal coherence.

Cite This Study

Hill et al. (1993) studied this question.

synapsesocial.com/papers/6a6f85b426a7f98052dc2cd3 https://doi.org/10.1063/1.108786

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March 8, 1993Applied Physics Letters

Bragg gratings fabricated in monomode photosensitive optical fiber by UV exposure through a phase mask

View Full Paper

Ask AI

Bookmark

Authors

KHK. O. HillUniversity of Auckland BMB. MaloCommunications Research Centre Canada FBF. BilodeauUniversité de Montréal

Discussion

Member takes

Overview

Experimental study demonstrates efficient photoimprinting of Bragg gratings in photosensitive optical fibers via silica phase masks, indicating simplified fabrication with reduced alignment...

Key Points

Develop a photolithographic method to fabricate refractive index Bragg gratings within photosensitive monomode optical fibers using a specialized silica glass phase mask.
Directed a 249 nm KrF excimer laser beam at normal incidence through a silica glass phase mask grating.
Placed photosensitive optical fiber parallel to and in close proximity behind the mask, with mask striations aligned normal to the fiber axis.
Diffracted UV light created a periodic, high-contrast intensity pattern at half the phase mask pitch, photoimprinting refractive index modulations into the fiber core.
The fabrication method decreased apparatus mechanical sensitivity and functioned successfully with laser sources possessing low spatial and temporal coherence.

Cite This Study

Hill et al. (1993) studied this question.

synapsesocial.com/papers/6a6f85b426a7f98052dc2cd3 https://doi.org/10.1063/1.108786

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