Lanthanum titanate and lithium lanthanum titanate thin films grown by atomic layer deposition

Thin films of lanthanum titanate and lithium lanthanum titanate (LLT) have been grown by atomic layer deposition (ALD). Studies on the growth of lanthanum titanates showed that the lanthanum deposition rate is reduced when the titanium oxide and lanthanum oxide processes are combined, leading to higher titanium contents in the films. The precursor systems used for deposition of lanthanum titanates were TiCl4 + water and La(thd)3 (thd = 2,2,6,6-tetramethyl-3,5-heptanedione) + ozone. Lithium was introduced into the material in order to deposit LLT by using lithium tert-butoxide (LiOtBu) and water as precursors. The deposited films were analyzed by time-of-flight elastic recoil detection analysis (TOF-ERDA), secondary ion mass spectrometry (SIMS), X-ray fluorescence (XRF), X-ray reflectivity (XRR) and X-ray diffraction (XRD). TOF-ERDA gave the film composition of Li0.32La0.30TiOz at saturation conditions.