Measurements were made of the sputter rate of fused silica by argon ions of energy 12-32 keV. Details of the experimental technique are described, particularly with regard to the elimination of systematic errors. The sputter rates were measured to an accuracy of better than ±10%, and the dependence on angle of ion incidence was determined. Results from other workers are summarized and compared with the new values.
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R. P. Edwin (1973) studied this question.
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