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June 1, 1989Japanese Journal of Applied Physics

In Situ Reflection High Energy Electron Diffraction Observation During Growth of YBa2Cu3O7-x Thin Films by Activated Reactive Evaporation

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Authors

TTTakahito TerashimaKyoto UniversityKIKenji IijimaThe University of OsakaKYKazunuki YamamotoChiba University

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Terashima et al. (1989) studied this question.

synapsesocial.com/papers/6a6fae448031ec7bb1dbe28bhttps://doi.org/10.1143/jjap.28.l987
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Also Consider

Synapse has enriched 5 closely related papers on similar clinical questions. Consider them for comparative context:

  1. 1Epitaxial growth of YBa2Cu3O7−x thin films on (110) SrTiO3 single crystals by activated reactive evaporation1988 · 96 citations
  2. 2As-Deposited Superconducting Ba2YCu3O7-y Films Using ECR Ion Beam Oxidation1988 · 53 citations
  3. 3High-Jc Superconducting Single Crystalline HoBaCuO Thin Films by Sputtering1988 · 73 citations
  4. 4Epitaxial growth of YBa2Cu3O7−x thin films by a laser evaporation process1988 · 395 citations
  5. 5Largely Anisotropic Superconducting Critical Current in Epitaxially Grown Ba2YCu3O7-y Thin Film1987 · 403 citations