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The effect of microwave-plasma on the decomposition and the oxidation of Ba(THD) 2 is studied for estimating the possibility of low-temperature chemical vapor deposition of oxide superconducting thin film. Pseudo in situ auger electron spectroscopy clarifies that carbon-free film is grown with oxygen-plasma at over 400°C. Pseudo in situ electron diffraction analysis indicated that the film grown at over 400°C is crystalline BaO. These results support the possibility that oxide superconducting film can grow at around 400°C by chemical vapor deposition using THD complexes.
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Sugii et al. (1991) studied this question.
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