Population
remote Ar/C2H2 expanding thermal plasma used for deposition of hydrogenated amorphous carbon films
Design
Other
Authors
Loading...
C3/C3H proposed as key precursors in C2H2 plasmas; leaves open validation for material synthesis applications.
C3 and C3H radicals are proposed to be significant growth precursors in plasma processes involving C2H2.
R. H. Cox (1978) studied this question.
Synapse has enriched 5 closely related papers on similar clinical questions. Consider them for comparative context: