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November 1, 2000Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena

Optimization of a lithographic and ion beam etching process for nanostructuring magnetoresistive thin film stacks

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Authors

MWMichael WalshEisenhower Medical CenterYHYaowu HaoThe University of Texas at ArlingtonCRC. A. RossBellingham Technical College

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Walsh et al. (2000) studied this question.

synapsesocial.com/papers/6a6ff719febe604dd708c8cbhttps://doi.org/10.1116/1.1324639
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