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November 1, 1981Journal of Vacuum Science and Technology

A simple technique for modifying the profile of resist exposed by holographic lithography

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Authors

NEN. N. EfremowMIT Lincoln LaboratoryNEN. P. EconomouHarvard UniversityKBK. BezjianStanford University

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Efremow et al. (1981) studied this question.

synapsesocial.com/papers/6a6ff6ab8031ec7bb1dc09a5https://doi.org/10.1116/1.571251
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