Grain size reduction by utilizing a very thin CrW seedlayer and dry-etching process in CoCrTaNiPt longitudinal media

To decrease grain size and grain size distribution in CoCr15Ta3.5Ni10Pt5/Cr longitudinal thin film media, a very thin CrW54 seedlayer combined with a dry-etching process were utilized. In the media dry etched after CrW54 deposition, utilization of 1.5 nm CrW54 reduces the grain diameter and σ to 9.4 and 2.2 nm, respectively. By optimizing CrW54 seedlayer thickness and dry-etching process, grain diameter and σ of the magnetic layer can be reduced while maintaining coercivity, longitudinal orientation of magnetic grains, and magnetic interactions.