The effect of O 2 additions below 0.2% to N 2 was investigated for the cleaning of organic contaminants on an indium tin oxide film using a nonequilibrium atmospheric-pressure pulsed plasma. A remarkably high cleaning efficiency was obtained for plasma treatment with additions from 0.025 to 0.1% O 2 to N 2 . The concentration of the ground state oxygen radical [O( 3 P)] was measured using vacuum UV laser absorption spectroscopy. It was found that the key factor for the surface cleaning was the scission of carbon bonds due to UV emissions, and subsequent oxidation due to O( 3 P) and ozone.
No takes yet. Share an insight, caveat, or question.
Iwasaki et al. (2007) studied this question.
Synapse has enriched 5 closely related papers on similar clinical questions. Consider them for comparative context: