Methods are described for measuring accurately the half-widths of frustrated total reflection filters (see reference 1) of very narrow pass bands, and for detecting extremely small non-uniformities in the spacer layers of these filters. The latter method, permitting observation and measurement of thin film non-uniformities appreciably less than one unit cell provides a very sensitive means of studying thin film structures and the mechanism of formation.
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Gee et al. (1949) studied this question.
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