Room‐Temperature Nanoimprint Lithography of Non‐thermoplastic Organic Films

A grating resolution of up to 200 nm is achieved using room‐temperature nanoimprint lithography on several different light‐emitting low‐molar‐mass organic semiconductors, without any degradation of the active materials after patterning (see Figure). This could be the only process that permits the transfer of a height profile to films of this very important class of low‐molar‐mass conjugated molecules with poor thermoplastic behavior.