Room-temperature nanoimprint lithography in air is used in order to pattern a nonthermoplastic, low-molar-mass thiophene-based pentamer with excellent gain properties. No degradation of the luminescence efficiency of the active medium was observed after patterning. In this way, we fabricated single-mode emission distributed feedback lasers having a threshold excitation fluence of 140 μJ/cm2. The lasing line is peaked at 637 nm and exhibits a linewidth of less than 0.7 nm and a well-behaved input-output characteristic in the whole range of pump fluences. These results demonstrate room-temperature nanoimprint lithography as powerful and straightforward fabrication technique for oligomer-based nanostructured optoelectronic devices.
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Pisignano et al. (2003) studied this question.
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