An apparatus is described in which it is possible to obtain simultaneous reflection high-energy electron diffraction and x-ray emission measurements from surfaces. The ultimate vacuum in the electron diffraction section of the apparatus is <10−9 torr so that both chemical and crystallographic information about clean surfaces and surfaces with adsorbed monolayers or thin film reaction products can be acquired. The sensitivity of the apparatus is illustrated with oxygen on the (001) surface of iron.
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Sewell et al. (1967) studied this question.
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