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May 1, 1967Japanese Journal of Applied Physics

Dissociative Diffusion of Nickel in Silicon and Self-Diffusion of Silicon

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Authors

MYMasayuki YoshidaLife Science InstituteKSKen SaitoTokyo University of Science

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Yoshida et al. (1967) studied this question.

synapsesocial.com/papers/6a708612febe604dd7094eadhttps://doi.org/10.1143/jjap.6.573
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