Answers are grounded in this paper and cite their sources.
The ratio of the etching rate of LiNbO 3 to AZ1350 at normal incidence for CHF 3 ion is about 5 times as large as that for Ar ion. This high ratio is utilized to fabricate LiNbO 3 blazed gratings and also LiNbO 3 guided wave optical elements such as grating couplers to demonstrate that reactive ion-beam etching is a very useful microfabrication technique for LiNbO 3 .
No takes yet. Share an insight, caveat, or question.
Matsui et al. (1980) studied this question.
Synapse has enriched 10 related papers. Consider them for comparative context: