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August 1, 1985Journal of Applied Physics

Measurement of the electron density and the attachment rate coefficient in silane/helium discharges

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Authors

CFC. B. FleddermannInstitute of Electrical and Electronics EngineersJBJ. H. BebermanUniversity of Illinois Urbana-ChampaignJVJ. T. VerdeyenCU Aerospace (United States)

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Fleddermann et al. (1985) studied this question.

synapsesocial.com/papers/6a70969af44fa9f079de4168https://doi.org/10.1063/1.336105
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