In this paper the competences of e-beam lithography are described for the production of computer generated holograms (CGHs). Three principles of e-beam systems are compared. Examples are given of optical devices made with e-beam lithography. Phase shifting masks for integrated circuit production are described. Relief phase gratings with 150 nm structures, binary CGHs and blazed structures have been made successfully.
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M.J. Verheijen (1993) studied this question.
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