Influence of process variables on electron beam chemical vapor deposition of platinum

Electron beam chemical vapor deposition was performed in a modified environmental scanning electron microscope to deposit platinum structures. Process variables including voltage, beam current, deposition time, dwell time, and line time were studied in statistically designed and analyzed experiments on fiber (pillar-like structures) and line (wall-like structures) deposition. Deposition rates and geometric features such as aspect ratio were optimized. Results from the experimentation showed the importance of the beam current, voltage, and adsorbate replenishment to the deposition process. Growth rates up to 0.9μm∕min were obtained for short deposition times.