Nanocomposites with Structure Domains of 0.5 to 3 nm by Polymerization of Silicon Spiro Compounds

Two from one: It is possible to form two different, interpenetrating polymer structures—silicon dioxide and a phenolic resin—simultaneously in a single step without the formation of by-products by using a readily polymerizable, organic silicon spiro compound. This new polymerization process enables the fabrication of materials with domain sizes of 0.5 to 3 nm.