Selective Vapor Deposition of Hydrous RuO[sub 2] Thin Films

Thin films of mixed-conducting hydrous ruthenium dioxide or were deposited via chemical vapor deposition at ambient pressure and temperature. The precursor was generated in situ and reduced to when it contacted specific functional groups, including alcohols, thiols, amines/amides, and clean metal surfaces. The was nonreactive when in contacted with surfaces of hydrocarbons, carboxylic acid groups, or metal oxides. Because of the selectivity of the deposition process, lines and patterns can be formed on substrates that are decorated with specific areas of reactive and nonreactive functional groups. films are conductive, catalytic for chloride evolution from brine, and may ultimately be useful as oxidation catalysts and methanol barrier layers in direct methanol fuel cells.