By irradiating the substrate surface with a Xe-lamp at 450 W/cm 2 , the deposition rate of Fe 3 O 4 film in ferrite plating was increased by a factor of 10 (from ∼30 nm/min to ∼320 nm/min). The high deposition rate in light-enhanced ferrite plating cannot be simply ascribed to the increase of thermal energy.
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Itoh et al. (1990) studied this question.
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