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The loss of Fe due to oxidation or diffusion into the substrate can prevent the successful preparation of well-ordered, stoichiometric, FePt nanoparticles. In this work we report the composition changes during annealing observed for small (<10nm) FePt nanoparticles on thermally grown SiO2 layers on Si wafer substrates. Additionally, we describe the use of a controlled reducing gas mixture, Ar+H2+H2O, to reduce the loss of Fe.
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Yao et al. (2006) studied this question.
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