Nano-particle photo spacers with superior physical characteristics have been fabricated into the defined patterns by lithographic processes in color filter manufacture processing. Cylinder-like photo spacers with several heights on the surface of subpixel cells in the defined patterns can be achieved by modulating process parameters. The dimension, height and shape of photo spacers are consistent with the designed pattern size in the mask and promise the reliable stability of photo-spacer materials. That the elastic recovery ratio of the defined pattern photo spacers is initially increased and then decreased with the increase of the applied loading is due to the intrinsic property of photo spacers in polymeric materials.
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Koo et al. (2008) studied this question.
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