Measurements of high-frequency (hf) resistance of thin films have been performed. It is shown that the relatively small decrease of resistance with frequency occurring for uniform resistance is due to self-capacitance; the simple transmission line theory of this effect, originally presented by Howe, is incorrect. Additional decrease of hf resistance beyond that due to self-capacitance has been found to be due to the presence of nonuniform regions in the resistor and not to the presence of intercrystallite barriers in the frequency range considered. Properly interpreted, hf measurements can give information concerning the presence of gross inhomogeneities in films.
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Broudy et al. (1954) studied this question.