The stable overlayer composition resulting from dissociative chemisorption of XeF2 on the Si(111)7×7 surface has been studied by x-ray photoelectron spectroscopy and thermal desorption spectrometry. Evidence is found for the existence of fluorine covalently bonded in the bulk; no evidence for unreacted interstitial fluorine is found.
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Roop et al. (1985) studied this question.
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