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A model of the primary energy deposition during laser annealing in layer systems is developed basing on the calculation of the divergence of the Poynting vector and taking into account the superposition of the field amplitudes inside each layer. The energy deposition function is calculated for the model systems: amorphous on crystalline silicon, polycrystalline Si/SiO2/crystalline Si, and molten Si/amorphous Si/crystalline Si. The influence of the interference effect on the total reflectivity, the energy deposition, and the transmission is discussed in dependence on the thicknesses of the layers.
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Geiler et al. (1983) studied this question.
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