Self-organized islands of uniform heights can form at low temperatures on metal/semiconductor systems as a result of quantum size effects, i.e., the occupation of discrete electron energy levels in the film. We compare the growth mode on two different substrates [Si(111)- (7×7) vs Si(111)- Pb(√3×√3)] with spot profile analysis low-energy electron diffraction. For the same growth conditions (of coverage and temperature) 7-step islands are the most stable islands on the (7×7) phase, while 5-step (but larger islands) are the most stable islands on the (√3×√3). A theoretical calculation suggests that the height selection on the two interfaces can be attributed to the amount of charge transfer at the interface.
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Yeh et al. (2000) studied this question.
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