The problem of high dielectric loss of waveguide on silicon in the microwave region can be solved by utilizing a thick silicon dioxide layer that is formed by silicon substrate anodization and oxidation processes. Coplanar waveguides (CPW's) are fabricated on silicon substrate with a 20-μm-thick oxidized porous silicon (OPS) layer and demonstrate very high performance of 0.1-dB/mm attenuation at 4 GHz. Thus, the OPS process is promising for gigaherz applications of silicon substrates.
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Nam et al. (1998) studied this question.
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