Experimental and theoretical study of energy dissipation profiles of keV electrons in polymethylmethacrylate

Energy dissipation profiles of keV electron beams in polymethylmethacrylate (PMM) were investigated both in theory and experiment. The results measured using a scanning electron microscope as a source of the electron beam were followed by the Monte Carlo calculations which were performed for the same conditions as the experiment. Good agreement was obtained not only for equidissipation profiles but also for absolute values of the energy dissipation between the experiment and the calculation. This encourages us to apply the Monte Carlo calculations to problems of electron resist exposure important for microelectronics.