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January 1, 1982Japanese Journal of Applied Physics

Reactive Ion Beam Etching Using a Broad Beam ECR Ion Source

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Authors

SMSeitaro MatsuoKyushu UniversityYAYoshio AdachiNational Institute of Public Health

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Matsuo et al. (1982) studied this question.

synapsesocial.com/papers/6a72c44d75498292b70bb9b4https://doi.org/10.1143/jjap.21.l4
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Also Consider

Synapse has enriched 4 closely related papers on similar clinical questions. Consider them for comparative context:

  1. 1Production of Large Area High Current Ion Beams1972 · 34 citations
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  3. 3Selective etching of Si relative to SiO2 without undercutting by CBrF3 plasma1980 · 38 citations
  4. 4Generation of energetic electrons by electron cyclotron heating in a magnetic mirror field1973