A 4-Mb CMOS DRAM measuring 6.9/spl times/16.11 mm/SUP 2/ has been fabricated using a 0.9-/spl mu/m twin-tub CMOS, triple-poly, single-metal process technology. N-channel depletion-type trench cells, 2.5/spl times/5.5 /spl mu/m/SUP 2/ each, are incorporated in a p-well. A novel built-in selftest (BIST) function which enables a simultaneous and automatic test of all the memory devices on a board is introduced to reduce the RAM testing time in a system. This function is effective for system maintenance and a daily start-up test even in a relatively small system. A high-speed low-power 4-Mb CMOS DRAM with 60-ns access time, 50-mA active current, and 200-/spl mu/A standby current is realized by widening the DQ line bus which connects the sense amplifiers with DQ buffers, thereby reducing the parasitic capacitance of the DQ lines.
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Ohsawa et al. (1987) studied this question.
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