Apparatus is described which is capable of producing thin films of bismuth oxide with refractive index 2.50 and index of absorption 0.03 (both measured at a wavelength of 5500 Å). The results described show the necessity for close control of the argon: oxygen ratio in the sputtering discharge, and a simple flowmeter is described that can provide such control.
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P B Clapham (1967) studied this question.
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