Dip‐Pen Nanolithography of Chemical Templates on Silicon Oxide

A flexible template strategy for the generation of nanometer‐scale templates via dip‐pen nanolithography is described. Trichlorosilanes are patterned with a chemically modified cantilever, and subsequently oxidized. The reactive template formed can be further modified by covalent attachment (e.g., of poly(ethylene imine), see Figure) or via electrostatic immobilization (e.g., of CdSe).