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November 7, 2012Optical Materials ExpressOpen Access

Nanopatterning of atomic layer deposited Al:ZnO films using electron beam lithography for waveguide applications in the NIR region

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Authors

KSKevin SantiagoNorfolk State UniversityRMR. MundleNorfolk State UniversityCSChandan B. Samantaray

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Santiago et al. (2012) studied this question.

synapsesocial.com/papers/6a745a0ec64913a07da7fcb7https://doi.org/10.1364/ome.2.001743
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