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A feasible method of grafting complex amine structures (methyl ester of glycine, Rho‐Lys‐Arg‐NH 2 , amine‐terminated oligonucleotide and 7,8,11,12‐tetrahydro‐5‐hexahelicenamine) onto a silicon wafer surface is described. The two step process comprises (1) anchoring 10‐isocyanatodecyltrichlorosilane to a 1.8–2‐nm thin silica layer on a single silicon wafer crystal (100) and (2) the attachment of amine substrates through a urea linkage by reacting those with isocyanate groups on the wafer surface. Both steps can be monitored by ATR FTIR showing the appearance/disappearance of the isocyanate band. Measuring the contact angles along with the AFM imaging of the surfaces indicated the formation of the monolayers.(© Wiley‐VCH Verlag GmbH & Co. KGaA, 69451 Weinheim, Germany, 2007)
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Perzyna et al. (2007) studied this question.
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