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October 1, 1980Journal of The Electrochemical SocietyOpen Access

Retardation of Destructive Breakdown of SiO2 Films Annealed in Ammonia Gas

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TITakashi ItoKansas State UniversityHAH. ArakawaPowertech Technology (Taiwan)TNTakao NozakiIdemitsu Kosan (Japan)

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Cite This Study

Ito et al. (1980) studied this question.

synapsesocial.com/papers/6a749ea1cc7f6f86c703272ehttps://doi.org/10.1149/1.2129385
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