A metod to compensate for surface charging of insulator surfaces during TOF‐SIMS experiments is described. For this purpose a pulsed low energy electron source is used, immediately after the ion extraction period. The surface potential is self adjusting, resulting in a stable spectrum. Besides, ESD effects are strongly suppressed. Positive and negative ion spectra of thick PMMA and PC substrates, containing surface active additives and of UV‐ozone cleaned glass substrates before and after trimethylsilylation are presented. From the glass samples the positive ESD spectra were also recorded by using a continuous electron beam. Comparison between the SSIMS and ESD results indicates that ESD is more surface sensitive and sufferes less from ion fragmentation than SSIMS.
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Lub et al. (1988) studied this question.
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