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January 1, 1985Journal of Mass Spectrometry

Evidence for a surface self-cleaning sputtering mechanism in fast atom bombardment mass spectrometry

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Authors

SWSelmer S. WongCalifornia Institute of TechnologyFRF. W. RöllgenUniversity of BonnIMI. ManzJohannes Gutenberg University Mainz

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Wong et al. (1985) studied this question.

synapsesocial.com/papers/6a7500eff5fc394144034498https://doi.org/10.1002/bms.1200120109
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